Fabrication of low-cost and large-area complex nanostructures: The fabrication process step by step

Published on December 12, 2013

Many nanooptical applications require suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this video, we show you the fabrication process step by step in the lab.

View also: An overview to the concept

Giessen Group | Universität Stuttgart, Germany

Jun Zhao is a Ph.D. student in 4th physics institute at university of Stuttgart. She graduated from university of Stuttgart with a diploma in Physics in April 2010.

Harald Giessen (*1966) graduated from Kaiserslautern University with a diploma in Physics and obtained his M.S. and Ph.D. in Optical Sciences from the University of Arizona in 1995. After a postdoc at the Max-Planck-Institute for Solid State Research in Stuttgart he moved to Marburg as Assistant Professor. From 2001-2004, he was associate professor at the University of Bonn. Since 2005, he holds the Chair for Ultrafast Nanooptics in the Department of Physics at the University of Stuttgart. He was guest researcher at the University of Cambridge, and guest professor at the University of Innsbruck and the University of Sydney, at A*Star, Singapore, as well as at Beijing University of Technology. He is associated researcher at the Center for Disruptive Photonic Technologies at Nanyang Technical University, Singapore. He received an ERC Advanced Grant in 2012 for his work on complex nanoplasmonics. He is on the advisory board of the journals “Advanced Optical Materials” and “Nanophotonics: The Journal”. He is a Fellow of the Optical Society of America.


Zhao, J., Zhang, C., Braun, P,, Giessen, H.: Large-Area Low-Cost Plasmonic Nanostructures in the NIR for Fano Resonant Sensing, Advanced Materials 2012, 24/35, OP247–OP252. DOI: 10.1002/adma.201202109

Cataldo, S., Zhao, J., C., Neubrech, F., Frank, B., Zhang, C., Braun, P., Giessen, H.: Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates, ACS Nano 2012, 6/1,979-985. DOI: 10.1021/nn2047982

Frank, B., C., Yin, X,, Schäferling, M., Zhao, J., Hein, S., Braun, P., Giessen, H.: Large-Area 3D Chiral Plasmonic Structures, ACS Nano 2013, 7/7,6321-6329. DOI: 10.1021/nn402370x

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